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Laboratorieudstyr, optisk udstyr og præcisionsudstyr (ikke briller) 2019/S 224-549535

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This regards a MLA 100 maskless aligner from Heidelberg Instruments Mikrotechnik GmbH, which is being used for photolithography. Traditionally, a pat-tern in micro and nanofabrication, has been produced by shining UV light through a chromium mask with a chromium pattern, thereby creating a ‘shado image’ on a silicon wafer with a thin pho-tosensitive film (photoresist). Contrary to this method, maskless aligners are writing the pattern directly on the wafer by means of a guided laser beam, thus eliminating the need for a shadow mask. This technique is especially advantageous in research and development projects, where frequent design changes often necessitate many new masks.

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Ordregiver Danmarks Tekniske Universitet — DTU
Deadline
Udbudstype EU-udbud
Udbudsdetaljer http://ted.europa.eu/udl?uri=TED:NOTICE:549535-2019:TEXT:EN:HTML
Leveringssted Hovedstaden
Dokumenttype Bekendtgørelse med henblik på frivillig forudgående gennemsigtighed